Release date:2025-04-01
industry:SOH, Spin on Hardmask, Semiconductor Manufacturing, Market TrendsThe essence of SOH lies in its spin-coating technology. During the process, liquid hardmask material is dropped onto the center of a rapidly spinning wafer. Centrifugal force causes the material to spread quickly and evenly across the surface, forming a thin film of uniform thickness. After curing, this film exhibits excellent hardness and chemical stability, effectively resisting corrosion from chemical agents during etching while precisely transferring patterns from the photoresist to underlying materials, ensuring accurate replication of intricate semiconductor structures.
Compared to traditional lithography mask technologies, SOH offers distinct advantages. First, its high resolution meets the growing demand for semiconductor miniaturization. In advanced manufacturing processes, where feature sizes continue to shrink, SOH’s uniform film formation and lithographic performance enable finer pattern transfers. Second, the SOH process is relatively simple and cost-effective, with spin-coating equipment easily automated and minimal material usage, reducing overall production costs. Additionally, SOH boasts superior thermal and chemical stability, maintaining performance reliability in complex manufacturing environments.
SOH proves indispensable across multiple domains. In integrated circuit (IC) manufacturing, it supports the precise fabrication of circuit structures for logic chips, as well as memory chips like DRAM and NAND. In microelectromechanical systems (MEMS) production, SOH facilitates high-precision manufacturing of microsensors and microactuators. In optoelectronic device fabrication—such as LEDs and lasers—SOH enhances pattern precision, boosting device performance and efficiency.
According to recent market research, the global SOH (Spin on Hardmask) market has seen steady growth in capacity, production, sales, and revenue from 2020 to 2024, with strong momentum projected to continue from 2025 to 2031. Leading manufacturers, including Samsung SDI, Merck Group, JSR, Nissan Chemical Industries, Shin-Etsu MicroSi, and YCCHEM, are fiercely competing in product specifications, pricing, and market share.
SOH products are primarily categorized into Spin on Carbon Hardmask (SOC), Spin on Metal Oxide Hardmask (MHM), and other types, finding applications in semiconductors (excluding memory), DRAM, NAND, and LCD industries. With the adoption of advanced technologies like Extreme Ultraviolet (EUV) lithography, enhancing SOH’s lithographic performance has become a key research focus. Simultaneously, improving its environmental sustainability is gaining traction to minimize the ecological impact of manufacturing processes.
Global material suppliers and equipment manufacturers are ramping up R&D investments to deliver higher-performing, cost-effective SOH solutions. Industry giants like Samsung SDI and Merck Group leverage their technological edge to dominate the market, while JSR and Nissan Chemical Industries diversify their offerings to capture niche segments. In China, domestic players like YCCHEM are rapidly emerging, advancing the localization of SOH production.
SOH (Spin on Hardmask) stands as a cornerstone of semiconductor manufacturing, thanks to its high resolution, cost efficiency, and broad applicability. Looking ahead, as process technologies evolve and market demand surges, innovation and competition in the SOH sector will intensify. Businesses and individuals tracking SOH developments can stay ahead by monitoring key players’ strategies and market data.